we are the largest silicon carbide epitaxial sheet manufacturer among Chinese silicon carbide epitaxial sheet manufacturers, with market shares of 30.6% and 32.5% in terms of revenue and sales volume, respectively. Epitaxial wafers are a key raw material for the production of power semiconductor devices. Compared with traditional semiconductor materials such as silicon, silicon carbide (as one of the third-generation semiconductor materials) has significant performance advantages and is more suitable for high pressure, high temperature and high frequency environments. By cutting, grinding, and polishing the silicon carbide substrate (the main raw material for our products), it is possible to obtain a single epitaxial sheet for growing the epitaxial layer, with a specific crystal surface and appropriate electrical, optical, and mechanical properties. Through the epitaxial process, specific single-crystal films can be grown on epitaxial sheets.