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The 26th China International Industry Fair is currently being held at the National Exhibition and Convention Center (Shanghai), where more than a hundred Shanghai scientific and technological innovation achievements are being showcased at the Innovation Science and Technology Hall. In front of Landau Suiyan's booth, an extreme ultraviolet (EUV) light source system prototype made its debut at the industry fair. This is also the most advanced domestically produced EUV light source prototype currently on public display, and it is also referred to as the "heart" of high-end lithography machines.
Extreme ultraviolet light sources are one of the three core components for manufacturing advanced process chips at 7 nanometers and below. They have long been subject to overseas technological monopolies and embargo restrictions, making them a key link constraining China's independent controllability of high-end chips.
On-site staff introduced that the localization rate of the light source system exhibited this time has reached 90%, with the vast majority of core components independently developed. The technical route is consistent with that of leading international manufacturers, and it can be used for chip exposure testing.
Although it is still 3-5 years away from mass production, this breakthrough has already taken a key step for domestic EUV light sources from the laboratory toward industrialization.
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