On the 17th, it was learned from the China Institute of Atomic Energy (CIAE) under the China National Nuclear Corporation that the country's first self-developed tandem high-energy hydrogen ion implanter (POWER-750H) has successfully generated a beam, with its core performance indicators reaching internationally advanced levels. This achievement signifies that China has comprehensively mastered the full-chain research and development technology for tandem high-energy hydrogen ion implanters, overcoming a critical link in the power semiconductor manufacturing chain, thereby laying a solid foundation for promoting the autonomy and controllability of high-end manufacturing equipment and ensuring the security of the industrial chain.
Ion implanters, alongside lithography machines, etching machines, and thin-film deposition equipment, are known as the "four core pieces of equipment" in chip manufacturing and are indispensable "hard requirement" tools for semiconductor production. For a long time, China was entirely dependent on imports for high-energy hydrogen ion implanters. Due to their high research difficulty and significant technical barriers, this equipment was one of the bottlenecks restricting the upgrade and development of China's key technology industries. Leveraging decades of profound expertise in the field of nuclear physics accelerators, the China Institute of Atomic Energy used tandem accelerator technology as the core method to solve a series of challenges. It has fully mastered the forward design capability for tandem high-energy hydrogen ion implanters, ranging from underlying principles to complete machine integration. This breakthrough shatters the technological blockade and long-term monopoly held by foreign companies in this domain. It will significantly enhance China's self-reliance capabilities in critical areas such as power semiconductors and provide powerful technical support for contributing to the "dual carbon" goals and accelerating the development of new quality productive forces.
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