ASML Announces Technological Breakthrough Set to Boost Chip Production by 50% by 2030

Deep News02-23 23:01

Researchers at ASML Holding NV have revealed a method to increase the light source power of critical chip manufacturing equipment, a breakthrough that could enhance chip production by up to 50% by 2030. Michael Purvis, the chief technology expert for extreme ultraviolet (EUV) light sources at ASML, stated in an interview that this is not a temporary demonstration but a fully functional system capable of delivering 1,000 watts under the same conditions required by customers. The newly disclosed technological advancement, announced on Monday, is intended to help ASML widen its lead over potential competitors by improving one of the most challenging aspects of its equipment. The company's researchers have successfully developed a way to increase EUV light source power from the current 600 watts to 1,000 watts. According to Teun Van Gogh, executive vice president in charge of ASML's NXE series EUV equipment, by the end of this decade, customers will be able to process approximately 330 silicon wafers per hour per machine, up from the current rate of 220 wafers.

Disclaimer: Investing carries risk. This is not financial advice. The above content should not be regarded as an offer, recommendation, or solicitation on acquiring or disposing of any financial products, any associated discussions, comments, or posts by author or other users should not be considered as such either. It is solely for general information purpose only, which does not consider your own investment objectives, financial situations or needs. TTM assumes no responsibility or warranty for the accuracy and completeness of the information, investors should do their own research and may seek professional advice before investing.

Comments

We need your insight to fill this gap

Leave a comment

{"i18n":{"language":"en_US"},"isChannel":false,"data":{"share":"https://ttm.financial/m/news/1163205086?lang=en_US&edition=fundamental","thumbnail":"","is_english":true,"pubTime":"2026-02-23 23:01","share_image_url":"https://static.laohu8.com/e9f99090a1c2ed51c021029395664489","id":"1163205086","market":"fut","top_or_hot":-1,"title":"ASML Announces Technological Breakthrough Set to Boost Chip Production by 50% by 2030","media":"Deep News","content":"<p>Researchers at ASML Holding NV have revealed a method to increase the light source power of critical chip manufacturing equipment, a breakthrough that could enhance chip production by up to 50% by 2030. Michael Purvis, the chief technology expert for extreme ultraviolet (EUV) light sources at ASML, stated in an interview that this is not a temporary demonstration but a fully functional system capable of delivering 1,000 watts under the same conditions required by customers. The newly disclosed technological advancement, announced on Monday, is intended to help ASML widen its lead over potential competitors by improving one of the most challenging aspects of its equipment. The company's researchers have successfully developed a way to increase EUV light source power from the current 600 watts to 1,000 watts. According to Teun Van Gogh, executive vice president in charge of ASML's NXE series EUV equipment, by the end of this decade, customers will be able to process approximately 330 silicon wafers per hour per machine, up from the current rate of 220 wafers.</p>","source":null,"html":"<!DOCTYPE html>\n<html>\n<head>\n<meta http-equiv=\"Content-Type\" content=\"text/html; charset=utf-8\" />\n<meta name=\"viewport\" content=\"width=device-width,initial-scale=1.0,minimum-scale=1.0,maximum-scale=1.0,user-scalable=no\"/>\n<meta name=\"format-detection\" content=\"telephone=no,email=no,address=no\" />\n<title>ASML Announces Technological Breakthrough Set to Boost Chip Production by 50% by 2030</title>\n<style type=\"text/css\">\na,abbr,acronym,address,applet,article,aside,audio,b,big,blockquote,body,canvas,caption,center,cite,code,dd,del,details,dfn,div,dl,dt,\nem,embed,fieldset,figcaption,figure,footer,form,h1,h2,h3,h4,h5,h6,header,hgroup,html,i,iframe,img,ins,kbd,label,legend,li,mark,menu,nav,\nobject,ol,output,p,pre,q,ruby,s,samp,section,small,span,strike,strong,sub,summary,sup,table,tbody,td,tfoot,th,thead,time,tr,tt,u,ul,var,video{ font:inherit;margin:0;padding:0;vertical-align:baseline;border:0 }\nbody{ font-size:16px; line-height:1.5; color:#999; background:transparent; }\n.wrapper{ overflow:hidden;word-break:break-all;padding:10px; }\nh1,h2{ font-weight:normal; line-height:1.35; margin-bottom:.6em; }\nh3,h4,h5,h6{ line-height:1.35; margin-bottom:1em; }\nh1{ font-size:24px; }\nh2{ font-size:20px; }\nh3{ font-size:18px; }\nh4{ font-size:16px; }\nh5{ font-size:14px; }\nh6{ font-size:12px; }\np,ul,ol,blockquote,dl,table{ margin:1.2em 0; }\nul,ol{ margin-left:2em; }\nul{ list-style:disc; }\nol{ list-style:decimal; }\nli,li p{ margin:10px 0;}\nimg{ max-width:100%;display:block;margin:0 auto 1em; }\nblockquote{ color:#B5B2B1; border-left:3px solid #aaa; padding:1em; }\nstrong,b{font-weight:bold;}\nem,i{font-style:italic;}\ntable{ width:100%;border-collapse:collapse;border-spacing:1px;margin:1em 0;font-size:.9em; }\nth,td{ padding:5px;text-align:left;border:1px solid #aaa; }\nth{ font-weight:bold;background:#5d5d5d; }\n.symbol-link{font-weight:bold;}\n/* header{ border-bottom:1px solid #494756; } */\n.title{ margin:0 0 8px;line-height:1.3;color:#ddd; }\n.meta {color:#5e5c6d;font-size:13px;margin:0 0 .5em; }\na{text-decoration:none; color:#2a4b87;}\n.meta .head { display: inline-block; overflow: hidden}\n.head .h-thumb { width: 30px; height: 30px; margin: 0; padding: 0; border-radius: 50%; float: left;}\n.head .h-content { margin: 0; padding: 0 0 0 9px; float: left;}\n.head .h-name {font-size: 13px; color: #eee; margin: 0;}\n.head .h-time {font-size: 11px; color: #7E829C; margin: 0;line-height: 11px;}\n.small {font-size: 12.5px; display: inline-block; transform: scale(0.9); -webkit-transform: scale(0.9); transform-origin: left; -webkit-transform-origin: left;}\n.smaller {font-size: 12.5px; display: inline-block; transform: scale(0.8); -webkit-transform: scale(0.8); transform-origin: left; -webkit-transform-origin: left;}\n.bt-text {font-size: 12px;margin: 1.5em 0 0 0}\n.bt-text p {margin: 0}\n</style>\n</head>\n<body>\n<div class=\"wrapper\">\n<header>\n<h2 class=\"title\">\nASML Announces Technological Breakthrough Set to Boost Chip Production by 50% by 2030\n</h2>\n\n<h4 class=\"meta\">\n\n\n<a class=\"head\" href=\"https://laohu8.com/wemedia/1039043262\">\n\n\n<div class=\"h-thumb\" style=\"background-image:url(https://community-static.tradeup.com/news/8296859682db4b478146245e72de1922);background-size:cover;\"></div>\n\n<div class=\"h-content\">\n<p class=\"h-name\">Deep News </p>\n<p class=\"h-time\">2026-02-23 23:01</p>\n</div>\n\n</a>\n\n\n</h4>\n\n</header>\n<article>\n<p>Researchers at ASML Holding NV have revealed a method to increase the light source power of critical chip manufacturing equipment, a breakthrough that could enhance chip production by up to 50% by 2030. Michael Purvis, the chief technology expert for extreme ultraviolet (EUV) light sources at ASML, stated in an interview that this is not a temporary demonstration but a fully functional system capable of delivering 1,000 watts under the same conditions required by customers. The newly disclosed technological advancement, announced on Monday, is intended to help ASML widen its lead over potential competitors by improving one of the most challenging aspects of its equipment. The company's researchers have successfully developed a way to increase EUV light source power from the current 600 watts to 1,000 watts. According to Teun Van Gogh, executive vice president in charge of ASML's NXE series EUV equipment, by the end of this decade, customers will be able to process approximately 330 silicon wafers per hour per machine, up from the current rate of 220 wafers.</p>\n\n</article>\n</div>\n</body>\n</html>\n","isBrief":false,"type":0,"news_type":1,"symbol":"IE00BD6J9T35.USD","symbol_name":"NEUBERGER BERMAN NEXT GENERATION MOBILITY \"A\" (USD) ACC","start_time":0,"source_url":"","article_id":"1163205086","we_media_id":"1039043262","thumbnails":[],"rights":null,"url":"https://stock-news.laohu8.com/highlight/detail?id=1163205086","pubTimestamp":1771858878,"columns":[],"sourceInfo":null,"weMediaInfo":{"media_name":"Deep News","introduction":"Global Stock Market Deep Analysis","home_visible":1,"id":"1039043262","head_image":"https://community-static.tradeup.com/news/8296859682db4b478146245e72de1922"},"summary":"Researchers at ASML Holding NV have revealed a method to increase the light source power of critical chip manufacturing equipment, a breakthrough that could enhance chip production by up to 50% by...","collect":0,"end_time":0,"defaultTopTitle":"","property":[],"viewcount":null,"language":"en","relate_stocks":{"IE00BD6J9T35.USD":"NEUBERGER BERMAN NEXT GENERATION MOBILITY \"A\" (USD) ACC","LU0345774631.USD":"NINETY ONE GSF AMERICAN FRANCHISE \"A\" (USD) INC","LU0823434583.USD":"BNP PARIBAS US GROWTH \"C\" (USD) ACC","IE0004445239.USD":"JANUS HENDERSON US FORTY \"A2\" (USD) ACC","LU0097036916.USD":"贝莱德美国增长A2 USD","BK4543":"AI","LU2063271972.USD":"富兰克林创新领域基金","LU0345774391.USD":"NINETY ONE GSF AMERICAN FRANCHISE \"A\" (USD) ACC","BK4147":"半导体设备","LU0823434740.USD":"BNP PARIBAS US GROWTH \"C\" (USD) INC","BK4585":"ETF&股票定投概念","BK4588":"碎股","ASMG":"2倍做多ASML ETF- Leverage Shares","LU1734074674.USD":"NINETY ONE GSF ASIA PACIFIC FRANCHISE \"A\"(USD) ACC","03165":"华夏欧优股对冲","ASMU":"Direxion Daily ASML Bull 2X ETF","BK4535":"淡马锡持仓","ASML":"阿斯麦"},"translate_title":"ASML宣布技术突破到2030年芯片产量将提高50%","themeId":"","isJumpTheme":false,"ttsUrl":null,"symbols_score_info":{"ASMU":1,"ASMG":1,"03165":1,"ASML":1},"content_text":"Researchers at ASML Holding NV have revealed a method to increase the light source power of critical chip manufacturing equipment, a breakthrough that could enhance chip production by up to 50% by 2030. Michael Purvis, the chief technology expert for extreme ultraviolet (EUV) light sources at ASML, stated in an interview that this is not a temporary demonstration but a fully functional system capable of delivering 1,000 watts under the same conditions required by customers. The newly disclosed technological advancement, announced on Monday, is intended to help ASML widen its lead over potential competitors by improving one of the most challenging aspects of its equipment. The company's researchers have successfully developed a way to increase EUV light source power from the current 600 watts to 1,000 watts. According to Teun Van Gogh, executive vice president in charge of ASML's NXE series EUV equipment, by the end of this decade, customers will be able to process approximately 330 silicon wafers per hour per machine, up from the current rate of 220 wafers.","kind":"news","is_publish_news":true,"is_publish_highlight":false,"is_publish_live":false,"is_publish_wemedia":null,"editions":null,"column":"","sentiment":"2","news_tag":"productRelease","news_rank":0,"symbols":[],"gpt_button":0,"need_auth":false,"code":"91000000","status":"200"},"commentList":[],"isCommentEnd":true,"newsSizeData":{"likeSize":0,"commentSize":0,"repostSize":0,"favoriteSize":0,"likeStatus":false,"favoriteStatus":false},"APP":{"userAgent":"Mozilla/5.0 AppleWebKit/537.36 (KHTML, like Gecko; compatible; ClaudeBot/1.0; +claudebot@anthropic.com)","isDev":false,"isTTM":true,"tenantId":"TBGLOBAL","deviceId":"web-server-community-laohu8-v3","version":"4.36.2","shortVersion":"4.36.2","platform":"web","vendor":"web","appName":"ttm","isIOS":false,"isAndroid":false,"isTiger":false,"isTHS":false,"isWeiXin":false,"isWeiXinMini":false,"isWeiBo":false,"isQQ":false,"isBaiduSwan":false,"isBaiduBox":false,"isDingTalk":false,"isToutiao":false,"isOnePlus":false,"isHuaWei":false,"isXiaomi":false,"isXiaomiWebView":false,"isOppo":false,"isVivo":false,"isSamsung":false,"isMobile":false},"href":"/m/news/1163205086","isCrawlerRequest":true}