According to reports, at the 26th China International Industry Fair, Landau Suiyan publicly showcased an EUV light source system prototype for the first time.
This is the most advanced domestically produced EUV light source prototype publicly displayed to date, and it is called the "heart" of high-end lithography machines.
This marks a major breakthrough in the domestic EUV light source field, with a key step from the laboratory to industrialization already taken.
Extreme ultraviolet (EUV) light sources are one of the three core components for manufacturing chips at 7nm and below advanced processes, and have long been subject to overseas technological monopolies and embargo restrictions, making them a key link constraining China's high-end chip self-sufficiency.
According to the introduction, the light source system exhibited this time has a domestic content rate of 90%, with the vast majority of core components independently developed, and its technical route is consistent with leading international manufacturers, and it can be used for chip exposure testing.
However, the light source system still needs 3 to 5 years to reach mass production, and the core challenges currently faced are improving output power and long-term operational stability.
Commercial EUV lithography systems require light source power to reach the hundreds of watts level and to maintain high reliability during long-term operation.
Taking ASML as an example, its EUV light source system has achieved mass production application since the 250W version was launched in 2018, and is currently evolving toward a higher 1000W power level.
According to the official website, Landau Suiyan's low-power EUV light source system FlintNano LPP-OXXO has entered the productization stage, with a drive laser power of 1000W, laser frequency of 1 to 20kHz, conversion efficiency greater than 2%, EUV energy greater than 15W, continuous operation time exceeding 100 hours, and plasma size of 60 micrometers.
The high-power extreme ultraviolet light source system FlintMicro-LPP series has completed proof of principle.
Analysts believe that the prototype displayed by Landau Suiyan at the Industry Expo currently verifies the feasibility of the technical route, but there is still a clear gap from the product maturity required for industrial-grade applications.
From the 15W-level EUV energy output to the hundreds-of-watts-level mass production requirement, what Landau Suiyan needs to overcome is not only a multiple-order increase in power, but also comprehensive breakthroughs in plasma stability, light source lifespan, and system integration reliability.
Guosheng Securities believes that domestic demand for domestic lithography machines exceeds domestic supply, and high-end lithography machines are still in the research and development stage and have not yet achieved large-scale mass production.
Under the continuous tightening of geopolitical risks, the domestic lithography machine industry chain has broad substitution space.
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